The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Sep. 16, 2022
Applicant:

Lawrence Livermore National Security, Llc, Livermore, CA (US);

Inventors:

Johanna Jesse Schwartz, Livermore, CA (US);

Marissa Wood, Oakland, CA (US);

Jianchao Ye, Tracy, CA (US);

Adam W. Jaycox, Livermore, CA (US);

Xiaoting Zhong, Livermore, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 1/28 (2006.01); B05D 1/26 (2006.01); H01M 6/40 (2006.01); H01M 10/0562 (2010.01); H01M 10/0565 (2010.01);
U.S. Cl.
CPC ...
G01N 1/2813 (2013.01); B05D 1/26 (2013.01); H01M 6/40 (2013.01); H01M 10/0562 (2013.01); H01M 10/0565 (2013.01); H01M 2300/0082 (2013.01);
Abstract

Screening for screening a material includes: providing active mixing direct-ink-writing of the material, providing in situ characterization substrates or probes that receive the material, and providing active learning planning for screening the material. The providing active mixing direct-ink-writing of the material prints five to ten films. The providing in situ characterization substrates or probes includes printing five to ten films on the substrates or probes with a first set of constituents. The providing active learning planning for screening the material includes providing machine learning that takes the first set of constituents and uses the first set of constituents to dictate a next batch of films to achieve improved additional sets of constituents.


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