The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Jan. 17, 2023
Eagleburgmann Germany Gmbh & Co. KG, Wolfratshausen, DE;
Ferdinand Werdecker, Walchensee, DE;
Andreas Fesl, Otterfing, DE;
EagleBurgmann Germany GmbH & Co. KG, Wolfratshausen, DE;
Abstract
The invention relates to a mechanical seal arrangement for sealing a process chamber (), which is filled with a non-toxic, gaseous process medium, with respect to a bearing chamber (), comprising a first mechanical seal () with a rotating slide ring () having a first sliding surface () and a stationary slide ring () having a second sliding surface (), which define a first sealing gap () between the sliding surfaces (), a second mechanical seal () with a rotating slide ring () having a third sliding surface () and a stationary slide ring () having a fourth sliding surface (), which define a second sealing gap () between the sliding surfaces (), a first pretensioning device () which prestresses the stationary slide ring () of the first mechanical seal () in the axial direction (X-X) and a second pretensioning device () which prestresses the stationary slide ring () of the second mechanical seal () in the axial direction (X-X), a fluid chamber () arranged between the first mechanical seal () and the second mechanical seal (), which is in fluid connection with the first and second sealing gap and, in operation, receives leakage from the process chamber () via the first sealing gap (), and from which a return line () leads off, configured for a return of process medium from the fluid chamber () to a process area.