The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Dec. 20, 2022
Societe Des Ceramiques Techniques, Bazet, FR;
Universite Paul Sabatier Toulouse Iii, Toulouse, FR;
Centre National DE LA Recherche Scientifique (Cnrs), Paris, FR;
Aimée Savourey, Leguevinleguevin, FR;
Lionel Presmanes, Nailloux, FR;
Yohann Thimont, Escalquens, FR;
Antoine Barnabe, Baziège, FR;
SOCIETE DES CERAMIQUES TECHNIQUES, Bazet, FR;
UNIVERSITE PAUL SABATIER TOULOUSE III, Toulouse, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), Paris, FR;
Abstract
The present invention relates to a method for producing a substoichiometric oxygen layer from titanium, vanadium, tungsten or molybdenum oxide on a substrate by magnetron sputtering a target in a chamber, the method being characterised in that the target consists of titanium, vanadium, tungsten or molybdenum oxide and in that it comprises the steps of: a) creating a vacuum in the chamber and adding an inert gas to same; b) simultaneously applying a first radiofrequency potential to the target and a second radiofrequency potential to the substrate so as to generate, in the chamber, a plasma that is suitable for simultaneously i) sputtering the target to deposit a layer of the titanium, vanadium, tungsten or molybdenum oxide on the substrate; and ii) sputtering the layer of titanium, vanadium, tungsten or molybdenum oxide deposited on the substrate to remove oxygen atoms from the layer.