The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Sep. 24, 2021
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Akiko Miki, Tokyo, JP;

Taishi Kitaguchi, Niigata, JP;

Akira Kitamura, Niigata, JP;

Mitsuo Narita, Niigata, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 1/32 (2006.01); A61K 47/38 (2006.01); C08B 13/00 (2006.01);
U.S. Cl.
CPC ...
C08L 1/32 (2013.01); A61K 47/38 (2013.01); C08B 13/00 (2013.01); C08L 2203/02 (2013.01); C08L 2203/30 (2013.01); C08L 2205/16 (2013.01); C08L 2205/18 (2013.01);
Abstract

There is provided a method for efficiently produce hydroxypropyl methyl cellulose phthalate (HPMCP) having excellent flowability, where acetic acid in a reaction product mixture subjected to a wash and recovery step can be reduced. More specifically, there is provided a method for producing HPMCP including an esterification step of esterifying hydroxypropyl methyl cellulose (HPMC) with phthalic anhydride in acetic acid as a solvent to obtain a reaction product solution containing HPMCP; a water addition step of adding water to the reaction product solution to obtain a water-added reaction product solution; an acetic acid removal step of removing at least a portion of the acetic acid from the water-added reaction product solution to obtain a mixture having an acetic acid content reduced; and a wash and recovery step of washing the mixture and recovering the HPMCP.


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