The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Apr. 11, 2023
Applicant:
Nexeon Limited, Abingdon, GB;
Inventors:
Jose Medrano Catalan, Oxford, GB;
Markus Andersson, Oxford, GB;
Assignee:
NEXEON LIMITED, London, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/38 (2006.01); C01B 32/963 (2017.01); C23C 16/04 (2006.01); C23C 16/24 (2006.01); H01M 4/134 (2010.01);
U.S. Cl.
CPC ...
C01B 32/963 (2017.08); C01P 2002/08 (2013.01); C01P 2004/61 (2013.01); C01P 2004/62 (2013.01); C01P 2006/12 (2013.01); C01P 2006/14 (2013.01); C01P 2006/16 (2013.01); C01P 2006/40 (2013.01);
Abstract
The invention relates to a process for preparing composite particles, the process comprising contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles. A controlled temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles is maintained during the contacting step.