The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Mar. 13, 2024
Suzhou Han Hua Semiconductor Co., Ltd, Jiangsu, CN;
Qian Fan, Suzhou, CN;
Xianfeng Ni, Suzhou, CN;
SUZHOU HAN HUA SEMICONDUCTOR CO., LTD., Jiangsu, CN;
Abstract
A method for fabricating a microlens array includes: step S, providing a first substrate, and forming a patterned mask layer on the first substrate; step S, etching the first substrate to form spaced grooves; step S, removing the patterned mask layer; step S, attaching a photoresist layer to the upper surface of the first substrate; step S, softening the photoresist layer so that it adheres to the inner wall of the groove to form a concave smooth surface; step S, solidifying the photoresist layer to form a working mold; applying an adhesive material and the working mold through the second substrate. The microlens array is produced by pressing the mold together or injecting PDMS material into the surface of the working mold.