The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Jul. 07, 2020
Applicant:
Ecole Polytechnique Federale DE Lausanne, Lausanne, CH;
Inventors:
Assignee:
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE, Lausanne, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/165 (2017.01); B29C 64/291 (2017.01); B29C 64/314 (2017.01); B33Y 10/00 (2015.01); B33Y 40/10 (2020.01); B33Y 70/10 (2020.01); B29K 105/16 (2006.01);
U.S. Cl.
CPC ...
B29C 64/165 (2017.08); B29C 64/291 (2017.08); B29C 64/314 (2017.08); B33Y 10/00 (2014.12); B33Y 40/10 (2020.01); B33Y 70/10 (2020.01); B29K 2105/162 (2013.01); B29K 2995/0031 (2013.01); B29K 2995/0056 (2013.01);
Abstract
The present invention is related to a method and apparatus for the volumetric fabrication of three-dimensional objects or articles from photoresponsive materials loaded with scattering particles, by adjusting the refractive index of said photoresponsive material () so as to match the refractive index of said scattering particles (), and/or using a light source emitting light of a wavelength longer than 630 nm, preferably in a range from 630 nm to 1050 nm, more preferably in a range from 650 nm to 900 nm.