The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Sep. 12, 2023
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventor:
Jiahong Wu, Yokkaichi, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/14 (2006.01); B08B 1/00 (2024.01); B08B 1/04 (2006.01); B08B 1/32 (2024.01); B08B 1/50 (2024.01); B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
B08B 3/14 (2013.01); B08B 1/32 (2024.01); B08B 1/50 (2024.01); B08B 3/02 (2013.01);
Abstract
An impurity recovery device according to the present embodiment may recover impurities present on a surface of a substrate. The substrate may be placed on a stage. A sprayer may spray a recovery liquid toward the substrate along a direction from a side of a central part of the substrate to a side of the end part of the substrate. A recovery portion may recover the recovery liquid from the end part of the substrate.
Wu, Jiahong. (2025). Impurity recovery device and impurity recovery method (U.S. Patent No. 12472533). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12472533
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile