The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Oct. 25, 2022
Applicant:

Tata Consultancy Services Limited, Mumbai, IN;

Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 61/22 (2006.01); B01D 61/14 (2006.01);
U.S. Cl.
CPC ...
B01D 61/22 (2013.01); B01D 61/145 (2013.01); B01D 2313/701 (2022.08);
Abstract

This disclosure relates generally to method and system to monitor and control continuous ultrafiltration (UF) process units. In real time, continuous operation of UF to handle variating concentration in feed stream is tedious and complex. The UF plant system receives a plurality of input data configured to UF process units and from the real time data outliers are removed and missing values are imputed. The prediction module predicts a volumetric concentration factor (VCF) value and a throughput value by selecting a model from a model repository. The optimization module optimizes the VCF value, and the throughput value based on a plurality of optimal variables recommended for a given feed concentration. The UF plant system controls the VCF value and the throughput value for a predefined period of a prediction horizon based on a plurality of trajectory profiles recommended for the feed flow rate, the pressure data, and a feed concentration.


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