The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Aug. 30, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Zihao Yang, Cupertino, CA (US);

Mingwei Zhu, San Jose, CA (US);

Lan Yu, Voorheesville, NY (US);

Zhebo Chen, San Jose, CA (US);

Robert Jan Visser, Menlo Park, CA (US);

Nag Patibandla, Pleasanton, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10N 60/01 (2023.01); G06N 10/40 (2022.01); H10N 60/80 (2023.01);
U.S. Cl.
CPC ...
H10N 60/0912 (2023.02); G06N 10/40 (2022.01); H10N 60/805 (2023.02);
Abstract

Exemplary methods of fabricating high quality quantum computing components are described. The methods include removing native oxide from a deposition surface of a silicon substrate in a cleaning chamber of a processing system, and transferring the silicon substrate under vacuum to a deposition chamber of the processing system. The methods further include depositing an aluminum layer on the deposition surface of the silicon substrate in the deposition chamber, where an interface between the aluminum layer and the deposition surface of the silicon substrate is oxygen free.


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