The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Sep. 07, 2022
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventor:

Ralf Rudolf, Dresden, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/60 (2025.01); H01L 21/762 (2006.01); H10D 30/01 (2025.01); H10D 30/65 (2025.01); H10D 62/10 (2025.01);
U.S. Cl.
CPC ...
H10D 30/601 (2025.01); H01L 21/7624 (2013.01); H10D 30/0285 (2025.01); H10D 30/65 (2025.01); H10D 62/10 (2025.01);
Abstract

A semiconductor device includes an insulator layer and a semiconductor layer formed on the insulator layer. The semiconductor layer includes a first region of a first conductivity type, a second region of a second conductivity type, and a lightly doped extension region of the first conductivity type separating the first region and the second region along a lateral x-axis. A dielectric structure laterally surrounds the semiconductor layer. At least one of the first region and the lightly doped extension region is formed at a distance to the dielectric structure along a lateral y-axis orthogonal to the x-axis. Along the x-axis and between the second region and the first region, a lateral extension of the semiconductor layer along the y-axis increases with increasing distance to the second region.


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