The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Oct. 28, 2022
Applicant:

Coherent, Inc., Santa Clara, CA (US);

Inventors:

Vernon Seguin, Windsor, CT (US);

David P. Schmelzer, West Hartford, CT (US);

Joel Fontanella, Tolland, CT (US);

Peter Rosenthal, West Simsbury, CT (US);

Assignee:

Coherent, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/136 (2006.01); H01S 3/117 (2006.01); H01S 3/13 (2006.01); H01S 3/223 (2006.01);
U.S. Cl.
CPC ...
H01S 3/136 (2013.01); H01S 3/117 (2013.01); H01S 3/1305 (2013.01); H01S 3/2232 (2013.01);
Abstract

A Q-switched gas laser apparatus with bivariate pulse equalization includes a gas laser, a sensor, and an electronic circuit. A Q-switch that switches the laser resonator between high-loss and low-loss states to generate a pulsed laser beam. The sensor obtains a measurement of the pulsed laser beam indicative of the laser pulse energy. The electronic circuitry operates the Q-switch to (a) repeatedly switch the laser resonator between the high-loss and low-loss states to set a repetition rate of laser pulses of the pulsed laser beam, (b) adjust a loss level of the low-loss state, based on the pulse energy measurement, to achieve a target laser pulse energy, and (c) adjust a duration of the low-loss state to achieve a target laser pulse duration. By adjusting both pulse energy and duration, uniform pulse energy and, if desired, uniform pulse duration are achieved over a wide range of repetition rates.


Find Patent Forward Citations

Loading…