The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2025
Filed:
Jun. 27, 2021
Delta Design, Inc., Poway, CA (US);
Ryan J. Stoddard, Seattle, WA (US);
Jonathan L. Herlocker, Seattle, WA (US);
Matt Mclaughlin, Seattle, WA (US);
Delta Design, Inc., Poway, CA (US);
Abstract
A method is disclosed for generating a corrective film pattern for reducing wafer bow in a semiconductor wafer fabrication process. The method inputs to a neural network a wafer bow signature for a predetermined semiconductor fabrication step. The neural network generates from the input a corrective film pattern corresponding to the wafer bow signature. The neural network is trained with a training dataset of wafer shape transformations and corresponding corrective film patterns.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile