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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12469707 B1

PDFFull Text
Date of Patent:
Nov. 11, 2025

Filed:

Oct. 24, 2023

Method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus

Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventor:

Arito Ogawa, Toyama, JP;

Assignee:

Kokusai Electric Corporation, Tokyo, JP;

Attorney:

Volpe Koenig

Primary Examiner:

Yasser A Abdelaziz

Int. Cl.
CPC ...
H01L 21/28 (2025.01); C23C 16/34 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); H10D 64/66 (2025.01);
U.S. Cl.
CPC ...
H01L 21/28088 (2013.01); C23C 16/34 (2013.01); C23C 16/45527 (2013.01); C23C 16/45544 (2013.01); C23C 16/4583 (2013.01); C23C 16/52 (2013.01); H10D 64/667 (2025.01);
Abstract

Described herein is a technique capable of suppressing the generation of particles due to a film peeling in a process chamber. According to one aspect of the technique, there is provided a method of manufacturing a semiconductor device, including: (a) loading a substrate with an oxide film formed thereon into a process chamber wherein a metal-containing film is formed on a wall or other location in the process chamber; (b) supplying into the process chamber with at least one among: a gas containing a group 14 element and hydrogen; and a gas containing oxygen; and (c) forming the metal-containing film on the substrate after (b).

Find Patent Forward Citations

Ogawa, Arito. (2025). Method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus (U.S. Patent No. 12469707). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12469707

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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