The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2025
Filed:
Oct. 06, 2022
Tencent Technology (Shenzhen) Company Limited, Guangdong, CN;
Haibo Qiu, Shenzhen, CN;
Dihong Gong, Shenzhen, CN;
Zhifeng Li, Shenzhen, CN;
Wei Liu, Shenzhen, CN;
Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;
Abstract
An image processing model can more accurately process a face image with an occluded face while reducing calculations and improving operation speed of a processing device, reducing training time and costs. A predicted recognition result of a sample face image and occlusion indication information based on an image processing model is obtained. The occlusion indication information indicates an image feature of a face occlusion area of the sample face image. A recognition error based on the predicted recognition result and a target recognition result is also obtained. A classification error is obtained based on the occlusion indication information and a target occlusion pattern corresponding to the sample face image. An occlusion pattern of the sample face image indicates a position and a size of the face occlusion area. A model parameter of the image processing model is updated based on the recognition error and the classification error.