The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Aug. 14, 2019
Applicant:

Ciena Corporation, Hanover, MD (US);

Inventors:

Sid Ryan, Montreal, CA;

Petar Djukic, Nepean, CA;

Todd Morris, Stittsville, CA;

Assignee:

Ciena Corporation, Hanover, MD (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06N 3/088 (2023.01); G06N 3/045 (2023.01); G06N 3/047 (2023.01);
U.S. Cl.
CPC ...
G06N 3/088 (2013.01); G06N 3/045 (2023.01); G06N 3/047 (2023.01);
Abstract

Systems and methods for detecting patterns in data from a time-series and for detecting outliers in network data in an unsupervised manner are provided. In one implementation, a method includes the steps of obtaining network data from a network to be monitored and creating a window from the obtained network data. The method also includes the step of detecting outliers of the obtained data with respect to the window using an unsupervised deep learning process (e.g., using a Generalized Adversarial Network (GAN) learning technique and/or a Bidirectional GAN (BiGAN) learning technique) for enabling the learning of a data distribution. The unsupervised process, for example, does not require manual intervention.


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