The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2025
Filed:
Nov. 23, 2022
International Business Machines Corporation, Armonk, NY (US);
Zhong Fang Yuan, Xi'an, CN;
Si Tong Zhao, Beijing, CN;
Tong Liu, Xi'an, CN;
Ya Juan Dang, Beijing, CN;
Teng Jiao Li, BeiJing, CN;
Tian Ji Yang, Beijing, CN;
Wen Jie Hao, Xi'an, CN;
Xiao Lin Sun, Ningbo, CN;
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
Provided are techniques for identifying and correcting model focus drift during model training. A model is trained using an original dataset with data, and the is classified into clusters. A representation is assigned to each of the clusters. A first visualization dashboard with visualizations is generated, where each visualization represents a first data distribution of an associated cluster using the representation assigned to that cluster. The model is fine-tuned using a fine-tune dataset. A second visualization dashboard is generated by updating each visualization, where each visualization represents a second data distribution of the associated cluster. It is determined that a cluster of the clusters has focus drift based on changes between the first data distribution and the second data distribution. The focus drift is corrected by: adding the data of the cluster to the fine-tune dataset to form a combined dataset and fine-tuning the model using the combined dataset.