The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Mar. 27, 2023
Applicant:

Santec Holdings Corporation, Aichi, JP;

Inventors:

Hiroyuki Itoh, Aichi, JP;

Atsushi Morosawa, Aichi, JP;

Keiji Isamoto, Aichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/06 (2006.01); G01B 9/02 (2022.01); G01B 9/02015 (2022.01);
U.S. Cl.
CPC ...
G01B 11/06 (2013.01); G01B 9/02016 (2013.01); G01B 9/02084 (2013.01); G01B 2210/56 (2013.01);
Abstract

A measurement apparatus for measuring a thickness of a semiconductor wafer includes: an optical system configured to perpendicularly irradiate a sample wafer and a reference wafer with light, and receive interference signals of the light reflected on front and back surfaces of the respective wafers; a signal processor configured to perform frequency analysis of the interference signals received by the optical system to obtain peak positions of a point spread function of the respective wafers; and a calculator configured to calculate a thickness 'tsample' of the sample wafer based on the peak position “x” of the sample wafer and the peak position “y” of the reference wafer obtained by the signal processor, and a thickness “treference” of the reference wafer.


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