The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Dec. 16, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Donghoon Kwon, Suwon-si, KR;

Hyojung Kim, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/34 (2012.01); B08B 3/02 (2006.01); B24B 7/22 (2006.01); B24B 37/10 (2012.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
B24B 37/34 (2013.01); B08B 3/022 (2013.01); B24B 7/228 (2013.01); B24B 37/107 (2013.01); H01L 21/02016 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01);
Abstract

A semiconductor substrate grinding apparatus including a chuck table configured to mount and fix a semiconductor substrate, so that a back side of the semiconductor substrate faces upwardly and rotates in one direction; a grinding wheel on the chuck table configured to grind the back side of the semiconductor substrate; a cleaning liquid supplier on the chuck table, spaced apart from the grinding wheel, and configured to supply a cleaning liquid to the back side of the semiconductor substrate for cleaning by-products generated by grinding the semiconductor substrate; a slurry supplier on the chuck table, adjacent to the cleaning liquid supplier, and configured to supply a slurry to the back side of the semiconductor substrate; and a polishing wheel on the chuck table, spaced apart from the slurry supplier, and configured to perform chemical mechanical polishing on the back side of the semiconductor substrate using the slurry.


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