The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

May. 17, 2023
Applicant:

Visera Technologies Company Ltd., Hsin-Chu, TW;

Inventors:

Yi-Hua Chiu, Hsin-Chu, TW;

Wei-Ko Wang, Hsin-Chu, TW;

Shih-Liang Ku, Hsin-Chu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10F 39/00 (2025.01); H04N 23/10 (2023.01); H04N 23/54 (2023.01); H04N 23/55 (2023.01); H04N 25/10 (2023.01); H04N 25/76 (2023.01); H04N 25/773 (2023.01); H04N 25/79 (2023.01);
U.S. Cl.
CPC ...
H10F 39/8063 (2025.01); H04N 23/10 (2023.01); H04N 23/54 (2023.01); H04N 23/55 (2023.01); H04N 25/10 (2023.01); H04N 25/79 (2023.01); H10F 39/024 (2025.01); H10F 39/026 (2025.01); H10F 39/8053 (2025.01); H10F 39/8057 (2025.01); H10F 39/809 (2025.01); H04N 25/76 (2023.01); H04N 25/773 (2023.01);
Abstract

A manufacturing method includes the following operations. A lens layer is formed above a substrate. A patterned hard mask layer is formed on the lens layer. The lens layer is etched to transfer a pattern of the patterned hard mask layer to the lens layer such that a plurality of lenses are defined, wherein the lens are micro-lenses or meta-surface lenses. A cladding layer is formed to cover the plurality of lenses and the substrate. Portions of the cladding layer are etched to form a first inclined sidewall and a second inclined sidewall, wherein the first inclined sidewall is above the second inclined sidewall, wherein a projection of the first inclined sidewall on the substrate is spaced apart from a projection of the second inclined sidewall on the substrate.


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