The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Jun. 15, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Ayako Furesawa, Tokyo, JP;

Yoshinori Tateishi, Kanagawa, JP;

Toshio Tomiyoshi, Kanagawa, JP;

Takahiro Hachisu, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10F 39/00 (2025.01); H01L 21/78 (2006.01); H10F 39/12 (2025.01); H10F 39/18 (2025.01);
U.S. Cl.
CPC ...
H10F 39/026 (2025.01); H01L 21/78 (2013.01); H10F 39/1895 (2025.01); H10F 39/1935 (2025.01); H10F 39/80 (2025.01); H10F 39/809 (2025.01); H10F 39/811 (2025.01); H10F 39/8057 (2025.01); H10F 39/8063 (2025.01);
Abstract

A disclosed method of manufacturing a semiconductor device includes singulating a bonded substrate including a first substrate provided with an interconnection structure layer and a first bonding layer and a second substrate provided with a second bonding layer opposed to the first bonding layer into a plurality of semiconductor devices. The bonded substrate includes functional element regions and a scribe region in a plan view. The singulating includes forming a groove in the scribe region, and cutting the bonded substrate in a region outside an inner side surface of the groove. The groove is formed penetrating one of the first substrate and the second substrate, the interconnection structure layer, and the first and second bonding layers. The groove extends from the one of the first substrate and the second substrate to a position deeper than all interconnection layers provided between the first and second substrates.


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