The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Mar. 30, 2021
Applicant:
Peking University, Beijing, CN;
Inventors:
Wei Sun, Beijing, CN;
Yahong Chen, Beijing, CN;
Assignee:
PEKING UNIVERSITY, Beijing, CN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); B82Y 5/00 (2011.01); B82Y 40/00 (2011.01); G03F 7/16 (2006.01); H10D 30/01 (2025.01); H10D 30/43 (2025.01); H10K 10/46 (2023.01); H10K 71/12 (2023.01); H10K 85/20 (2023.01);
U.S. Cl.
CPC ...
H10D 62/119 (2025.01); G03F 7/162 (2013.01); H10D 30/014 (2025.01); H10D 30/43 (2025.01); H10K 10/464 (2023.02); H10K 10/484 (2023.02); H10K 71/12 (2023.02); H10K 85/221 (2023.02); B82Y 5/00 (2013.01); B82Y 40/00 (2013.01);
Abstract
A method for depositing nanostructures on a substrate comprises: forming a patterned alignment layer on a surface of the substrate, wherein the patterned alignment layer has one or more cavities each having a main region for accommodating at least one template nanostructure therein and a plurality of extension regions extending from the main region and in fluid communication with the main region, and wherein the plurality of extension regions are sized and shaped to not accommodate the at least one template nanostructure; and diffusing template nanostructures into the one or more cavities of the patterned alignment layer.