The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Jan. 31, 2022
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventor:

Takashi Tsuji, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H01L 21/76 (2006.01); H01L 21/761 (2006.01); H10D 12/01 (2025.01); H10D 30/66 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01);
U.S. Cl.
CPC ...
H10D 62/109 (2025.01); H01L 21/7602 (2013.01); H01L 21/761 (2013.01); H10D 12/031 (2025.01); H10D 30/668 (2025.01); H10D 62/108 (2025.01); H10D 62/393 (2025.01); H10D 62/8325 (2025.01);
Abstract

A semiconductor device includes: a high-concentration layer of a first conductivity-type provided on a drift layer of the first conductivity-type; a buried layer of a second conductivity-type provided in the high-concentration layer; an injection regulation region of the second conductivity-type provided on the high-concentration layer; a high-concentration region of the second conductivity-type provided inside the injection regulation region; a carrier supply region of the first conductivity-type provided at an upper part of the injection regulation region; and an insulated gate structure provided inside a trench, wherein a ratio of the impurity concentration of the injection regulation region to an impurity concentration of an upper part of the high-concentration layer is 0.5 or greater and 2 or smaller.


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