The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Feb. 15, 2024
Applicant:

Essex Furukawa Magnet Wire Usa Llc, Atlanta, GA (US);

Inventor:

Scott Ted Jolley, Davenport, FL (US);

Assignee:

Essex Solutions USA LLC, Atlanta, GA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02K 3/30 (2006.01); C08K 3/16 (2006.01); C08K 3/22 (2006.01); H01B 3/00 (2006.01); H01B 7/02 (2006.01); H01B 13/00 (2006.01); H01B 13/016 (2006.01); H01B 13/06 (2006.01); H02K 3/40 (2006.01);
U.S. Cl.
CPC ...
H02K 3/40 (2013.01); C08K 3/16 (2013.01); C08K 3/22 (2013.01); H01B 3/004 (2013.01); H01B 7/0208 (2013.01); H01B 13/0026 (2013.01); H01B 13/0036 (2013.01); H01B 13/016 (2013.01); H01B 13/067 (2013.01); H02K 3/30 (2013.01); C08K 2003/2231 (2013.01); C08K 2201/001 (2013.01);
Abstract

A method for forming magnet wire with improved partial discharge performance may include providing a conductor, forming a first layer of polymeric enamel insulation formed around the conductor, and forming a second semi-conductive layer around the first layer. Forming the second layer may include providing a base polyamic acid and complexing filler particles with the base polyamic acid. The polyamic acid may be applied around the first layer, and the filler particles may migrate towards an outer surface of the second layer. The polyamic acid may be cured to form a semi-conductive enamel layer, and at least sixty percent by weight of the filler particles may be positioned within an outer half of the second layer following the migration.


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