The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Dec. 07, 2021
Applicant:

Shine Technologies, Llc, Janesville, WI (US);

Inventors:

Daniel Martin, Janesville, WI (US);

Joseph Sherman, Santa Fe, NM (US);

Sarko Cherekdjian, Janesville, WI (US);

Assignee:

SHINE Technologies, LLC, Janesville, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/22 (2006.01); A61N 1/44 (2006.01);
U.S. Cl.
CPC ...
H01J 27/22 (2013.01); A61N 1/44 (2013.01);
Abstract

An ion source includes a chamber having a first end, a second end opposite the first end, a first wall extending from the first end to the second end, and a second wall opposite the first wall. The ion source also includes a source filament at the first end of the chamber and configured to emit electrons and a first amount of heat, a beam aperture at the second wall of the chamber, and one or more heaters positioned within the chamber and between the second end and the beam aperture and operable to provide a second amount of heat. The one or more heaters are positioned and operable such that the second amount of heat balances the first amount of heat to reduce or eliminate a temperature gradient in the chamber.


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