The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Nov. 21, 2022
Tencent Technology (Shenzhen) Company Limited, Guangdong, CN;
Xingyu Chen, Shenzhen, CN;
Ruixin Zhang, Shenzhen, CN;
Fuzhao Ou, Shenzhen, CN;
Yuge Huang, Shenzhen, CN;
Shaoxin Li, Shenzhen, CN;
TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED, Guangdong, CN;
Abstract
A face image quality assessment method includes acquiring a face image, and determining a similarity distribution distance of the face image, the similarity distribution distance including a distribution distance between an intra-person similarity distribution of the face image and an inter-person similarity distribution of the face image. The intra-person similarity distribution indicates a similarity distribution between the face image and a first-type image of a same person as the face image, and the inter-person similarity distribution indicates a similarity distribution between the face image and a second-type image of a different person from the face image. The method further includes determining image quality of the face image based on the similarity distribution distance of the face image.