The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Feb. 04, 2019
Abb Schweiz Ag, Baden, CH;
Daniele Angelosante, Turgi, CH;
Jacobus Lodevicus Martinus Van Mechelen, Regensdorf, CH;
Deran Maas, Zürich, CH;
Giorgio Signorello, Zürich, CH;
Marco Guerriero, Baden, CH;
ABB Schweiz AG, Baden, CH;
Abstract
A method for modelling a coating process including a plurality of coating parameters, includes the steps of: dispensing, by the coating process and during K work cycles, a coating on each of K pieces of objects to thereby obtain K pieces of coatings; recording, during each of the K work cycles, coating variable values of p coating parameters at M instances to thereby obtain recording results; and measuring at least one coating property at m locations of each of the K pieces of coatings to thereby obtain measurement results. The method is characterized by the step of determining a digital twin of the coating process on the basis of the recording results and the measurement results. By using results from a large amount of classical quality control measurements together with corresponding coating parameter information, a digital twin of the coating process can be determined through statistical processing of such big data. The digital twin may be used either for automatic adjustment of the coating parameters to obtain an improved coating quality, for prediction of the coating quality right after a work cycle to obtain an improved quality control, or for both.