The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Jun. 03, 2021
Applicant:
Duk San Neolux Co., Ltd., Cheonan-si, KR;
Inventors:
Changmin Lee, Cheonan-si, KR;
Yun Jong Ko, Cheonan-si, KR;
Jun Bae, Cheonan-si, KR;
Jun Ki Kim, Cheonan-si, KR;
Hyunsang Cho, Cheonan-si, KR;
Soung Yun Mun, Cheonan-si, KR;
Assignee:
DUK SAN NEOLUX CO., LTD., Cheonan-si, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/105 (2006.01); G03F 7/004 (2006.01); G03F 7/031 (2006.01); G03F 7/033 (2006.01); H10K 59/80 (2023.01);
U.S. Cl.
CPC ...
G03F 7/105 (2013.01); G03F 7/0042 (2013.01); G03F 7/0045 (2013.01); G03F 7/031 (2013.01); G03F 7/033 (2013.01); H10K 59/8792 (2023.02); H10K 59/80 (2023.02);
Abstract
According to one embodiment of the present disclosure, a photosensitive resin composition comprising a resin containing a repeating unit represented by Chemical Formula (1), a dye represented by Chemical Formula (2), a reactive unsaturated compound, a pigment, an initiator, and a solvent, and a display device comprising a pattern layer containing a polymerization reaction product of the photosensitive resin composition are provided.