The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Apr. 20, 2021
Soochow University, Suzhou, CN;
Yan An, Suzhou, CN;
Rui Yan, Suzhou, CN;
Jiayuan Mao, Suzhou, CN;
Qianlei Yang, Suzhou, CN;
Haixuan Xia, Suzhou, CN;
Qi Kong, Suzhou, CN;
Yuanjie Wei, Suzhou, CN;
SOOCHOW UNIVERSITY, Suzhou, CN;
Abstract
The present invention relates to the technical field of model establishment, and provides a dimethylarsinous acid-induced malignantly transformed cell line of human keratinocytes and application thereof. In the present invention, human keratinocytes are persistently exposed to and incubated with a low dose of dimethylarsinous acid, to construct an inorganic arsenic metabolite dimethylarsinous acid (DMA)-induced malignantly transformed cell model of human keratinocytes. The malignantly transformed cell model of the present invention promotes the identification of carcinogenicity of arsenic methylated metabolites, and indicates that long-term exposure to low-dose arsenic metabolite dimethylarsinous acid (DMA) causes malignant transformation of skin cells, thus providing a new cell model basis and new research idea for the study of carcinogenic mechanism of arsenic.