The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Jul. 24, 2023
Samsung Display Co., Ltd., Yongin-si, KR;
Hims Co., Ltd., Incheon, KR;
Chanhyeong Cho, Yongin-si, KR;
Tae Joon Kim, Yongin-si, KR;
Jeongmin Park, Yongin-si, KR;
Hyeonguk Yeo, Yongin-si, KR;
Juil Kim, Incheon, KR;
Daehoon Min, Incheon, KR;
SAMSUNG DISPLAY CO., LTD., Gyeonggi-do, KR;
HIMS CO., LTD., Incheon, KR;
Abstract
A photomask inspection apparatus includes a stage which supports an inspection substrate, a first optical system having a first numerical aperture and disposed at one side of the inspection substrate, a second optical system having a second numerical aperture, spaced apart from the first optical system, and disposed at the one side of the inspection substrate, an imaging optical system including a first objective lens aligned with the first optical system with the inspection substrate disposed therebetween, a second objective lens aligned with the second optical system with the inspection substrate disposed therebetween, and disposed at another side of the inspection substrate, which is opposite to the one side of the inspection substrate, and a camera which captures an image passed through the imaging optical system. The first numerical aperture is greater than the second numerical aperture.