The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Dec. 22, 2021
Applicant:
Hutchinson Technology Incorporated, Hutchinson, MN (US);
Inventors:
Douglas P. Riemer, Waconia, MN (US);
Andrew R. Dick, Eau Claire, WI (US);
Assignee:
Hutchinson Technology Incorporated, Hutchinson, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/14 (2006.01); C23C 14/58 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/5873 (2013.01); C23C 14/14 (2013.01); H01J 37/32357 (2013.01); H01J 2237/334 (2013.01);
Abstract
Treatment solutions and methods for treating a substrate including forming a first layer on a surface of the substrate, providing a process gas to the one or more plasma sources, the process gas includes a gas mixture of a reactive gas species and an inert gas species; forming a plasma under vacuum in the one or more plasma sources; and exposing the substrate to the plasma under vacuum to treat the first layer on the surface of the substrate.