The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Aug. 19, 2022
Applicants:
Agc Inc., Tokyo, JP;
Agc Si-tech Co., Ltd., Kitakyushu, JP;
Inventors:
Toshiya Matsubara, Tokyo, JP;
Hyunji Kim, Tokyo, JP;
Hajime Katayama, Tokyo, JP;
Yusuke Arai, Tokyo, JP;
Assignees:
AGC Inc., Tokyo, JP;
AGC SI-TECH CO., LTD., Kitakyushu, JP;
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/18 (2006.01); C09C 1/30 (2006.01);
U.S. Cl.
CPC ...
C01B 33/18 (2013.01); C09C 1/3027 (2013.01); C09C 1/3081 (2013.01); C01P 2002/82 (2013.01); C01P 2004/34 (2013.01); C01P 2004/61 (2013.01); C01P 2004/64 (2013.01); C01P 2006/10 (2013.01); C01P 2006/12 (2013.01); C01P 2006/14 (2013.01);
Abstract
The present invention related to a hollow silica particle including: a shell layer containing silica; and a space formed inside the shell layer, in which the hollow silica particle has a particle density as measured by a dry pycnometer density measurement using helium gas of 2.00 g/cmor more and a particle density as measured by a dry pycnometer density measurement using oxygen gas of lower than 2.00 g/cm.