The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Sep. 24, 2021
Applicant:

Ii-vi Delaware, Inc, Wilmington, DE (US);

Inventors:

Romon Chakrabarti, Berlin, DE;

Danny Chan, Berlin, DE;

Patrick Kühl, Berlin, DE;

Hannes Noack, Ludwigsfelde, DE;

Georg Schmidt, Stahnsdorf, DE;

Alexander Müller, Ahrensfelde, DE;

Assignee:

II-VI DELAWARE, INC., Wilmington, DE (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/38 (2014.01); B23K 26/06 (2014.01); B23K 26/12 (2014.01); B23K 26/142 (2014.01);
U.S. Cl.
CPC ...
B23K 26/38 (2013.01); B23K 26/0643 (2013.01); B23K 26/0648 (2013.01); B23K 26/128 (2013.01); B23K 26/142 (2015.10);
Abstract

A laser processing head for directing a laser beam includes two reflectors and a sole lens element. The first reflector disposed in a housing's interior reflects the laser beam from a source to the second reflector, which then reflects the laser beam toward a process zone for a workpiece. The single lens element is disposed in the housing's interior between the reflectors. The lens element can be moved to adjust a focal position of the laser beam beyond the housing's outlet. To reduce contamination, one or more nozzles are configured to direct purge gas across one or more of the first reflector, the second reflector, and the lens element, while one or more collection areas disposed in the interior are configured to collect contamination directed from the purge gas.


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