The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
May. 06, 2021
The Chinese University of Hong Kong, Hong Kong, CN;
President and Fellows of Harvard College, Cambridge, MA (US);
Lei Xu, Hong Kong, CN;
David Weitz, Bolton, MA (US);
Zhuo Xu, Guangzhou, CN;
Changliang Zhu, Yantai, CN;
The Chinese University of Hong Kong, Hong Kong, CN;
President and Fellows of Harvard College, Cambridge, MA (US);
Abstract
The subject invention pertains to methods to produce amorphous materials at nanometer scale, by solidifying or hardening the materials inside nanometer-sized pores of porous media (i.e., porous templates). The porous templates can be made by packing nanometer-sized particles or other means. The subject invention further pertains to methods to produce the porous templates used to produce amorphous material at nanometer scale.