The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Dec. 02, 2021
Koninklijke Philips N.v., Eindhoven, NL;
Thomas Koehler, Norderstedt, DE;
Roland Proksa, Neu Wulmstorf, DE;
Kevin Martin Brown, Chardon, OH (US);
KONINKLIJKE PHILIPS N.V., Eindhoven, NL;
Abstract
A method for use in a material decomposition procedure applied to dual-energy CT projection data. Material decomposition is often done using pre-computed lookup tables (LUTs) for mapping input projection data, acquired with particular X-ray source parameters, to material data values. However, the X-ray source parameters can vary over the course of a scan, making the results inaccurate. Embodiments are based on determining in advance a plurality of sets of basis LUTs for each of a plurality of different possible ranges of values over which the X-ray source parameter may vary during a scan. The basis LUTs in each set are devised as being LUTs which represent the majority contribution to the overall material decomposition function for the time-varying energy spectrum. When performing a material decomposition procedure, an appropriate set of the basis LUTs is chosen, based on an identified range of variation of the X-ray source parameter during the scan, and a linear combination of the basis LUTs is defined, using weightings which depend upon instantaneous values of the X-ray source parameter during the scan period.