The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Dec. 16, 2019
Cinogy Gmbh, Duderstadt, DE;
Dirk Wandke, Heilbad Heiligenstadt, DE;
Ronny Lettke, Duderstadt, DE;
CINOGY GMBH, Duderstadt, DE;
Abstract
In a plasma treatment arrangement for carrying out dielectrically impeded plasma discharge onto a surface to be treated having a flat electrode unit () which has a treatment side, and a control unit () which supplies at least one electrode () of the electrode unit () with a high-voltage AC potential for a power which is required for plasma generation between the at least one electrode () and a counterelectrode which forms a reference potential, wherein the at least one electrode () which receives the high-voltage AC potential is shielded with a flat dielectric (), at least on the treatment side, and wherein the flat electrode unit is designed to reduce the size of its support area on the surface to be treated for the purpose of adaptation to the size of the surface to be treated, the adaptation of the support area of the flat electrode unit () becomes possible in an unproblematical manner on account of the control unit () having a device () for determining the size of the adapted support area and a control device for adjusting the power to be output to the at least one electrode () in accordance with the determined size of the support area.