The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Apr. 15, 2024
Interdigital Vc Holdings, Inc., Wilmington, DE (US);
Xiaoyu Xiu, San Diego, CA (US);
Yuwen He, San Diego, CA (US);
Yan Ye, San Diego, CA (US);
Saurav Bandyopadhyay, San Diego, CA (US);
InterDigital VC Holdings, Inc., Wilmington, DE (US);
Abstract
Systems, methods, and instrumentalities are described herein for calculating local illumination compensation (LIC) parameters for bi-predicted coding unit (CU). The LIC parameters may be used to generate adjusted samples for the current CU and to address local illumination changes that may exist among temporal neighboring pictures. LIC parameters may be calculated based on bi-predicted reference template samples and template samples for a current CU. Bi-predicted reference template samples may be generated based on reference template samples neighboring temporal reference CUs. For example, the bi-predicted reference template samples may be generated based on averaging the reference template samples. The reference template samples may correspond to template samples for the current CU. A CU may be or may include a coding block and/or a sub-block that may be derived by dividing the coding block.