The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Nov. 06, 2023
Applicant:
GM Global Technology Operations Llc, Detroit, MI (US);
Inventors:
Chuanlong Wang, Troy, MI (US);
Xiaowei Yu, Farmington Hills, MI (US);
Ming Wang, Sterling Heights, MI (US);
Xiaosong Huang, Novi, MI (US);
Ryan Curtis Sekol, Grosse Pointe Woods, MI (US);
Assignee:
GM GLOBAL TECHNOLOGY OPERATIONS LLC, Detroit, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/0435 (2013.01); H01M 4/0411 (2013.01); H01M 2004/028 (2013.01);
Abstract
A method for manufacturing patterned electrodes includes extruding a mixture including an active material, a conductive additive, a binder, and a solvent from an extruder to form an active material layer; laminating the active material layer and a current collector; and patterning the active material layer using a patterned roller including a plurality of projections that form a plurality of features extending into the active material layer.