The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Dec. 13, 2024
Applicant:
The Methodist Hospital, Houston, TX (US);
Inventors:
Xuewu Liu, Sugar Land, TX (US);
Gauri Bhave, Richmond, TX (US);
Assignee:
The Methodist Hospital, Houston, TX (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/469 (2023.01); B01D 61/44 (2006.01); B01D 61/46 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67086 (2013.01);
Abstract
The present disclosure provides a reaction chamber, and methods of using the same, wherein the reaction chamber includes a mesh cathode, a first anode, a second anode, and a reaction chamber body, wherein the reaction chamber body is hollow and has a first opening and a second opening, where semiconductor wafers to be electrochemically etched can be sealed. One benefit of the reaction chamber and methods disclosed herein can be allowing for numerous etching operations to be performed with minimal or no contact of the operator with the etching solution, such as hydrofluoric acid.