The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2025

Filed:

Nov. 04, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Si Er Han, Xian, CN;

Ji Hui Yang, Beijing, CN;

Xiao Ming Ma, Xian, CN;

Jing Xu, Xian, CN;

Xue Ying Zhang, Xian, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 18/20 (2023.01); G06F 18/21 (2023.01); G06F 18/232 (2023.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 18/217 (2023.01); G06F 18/232 (2023.01); G06F 18/285 (2023.01);
Abstract

A method, system, and computer program product for incremental machine learning for a parametric machine learning model are disclosed. The method may include processing samples comprising historical samples and new samples with an existing parametric machine learning model to obtain at least one prediction residual of each of the samples, wherein the existing parametric machine learning model was trained based on the historical samples. The method may further include clustering the samples based on the at least one prediction residual of each of the samples and features of each of the samples. The method may further include sampling samples in each cluster to ensure that each cluster includes substantially similar number of sampled samples. The method may further include updating the existing parametric machine learning model to obtain an updated parametric machine learning model based on sampled samples in each cluster.


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