The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2025

Filed:

Sep. 05, 2023
Applicant:

Amazon Technologies, Inc., Seattle, WA (US);

Inventors:

Kshitij Mishra, Lawndale, CA (US);

Tamer Soliman, Millbrae, CA (US);

Aram Galstyan, Los Angeles, CA (US);

Anoop Kumar, Fountain Valley, CA (US);

Anil K Ramakrishna, Culver City, CA (US);

Assignee:

Amazon Technologies, Inc., Seattle, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/27 (2006.01); G06F 40/40 (2020.01);
U.S. Cl.
CPC ...
G06F 40/40 (2020.01);
Abstract

Techniques for updating a large language model (LLM) to correct generation of undesired responses, such as incorrect outputs, toxic outputs, etc. are described. Typical methods of retraining and fine-tuning are inefficient and computationally expensive for LLMs. Some embodiments of the present disclosure involve identifying a salient layer of the LLM that is responsible for the undesired response and editing only the salient layer. This layer is identified by computing a saliency value for the layer using a mean of gradient values for the layer, and the layer with the greatest saliency value is selected for editing. For editing, a small network is used to update the weights of the selected layer. The LLM is updated to include the edited layer, and the updated LLM is used for future processing.


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