The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2025

Filed:

Apr. 17, 2024
Applicant:

Samsung Display Co., Ltd., Yongin-Si, KR;

Inventors:

Hwan-Hee Jeong, Yongin-si, KR;

Sungkyun Park, Yongin-si, KR;

Soyeon Park, Yongin-si, KR;

Giryung Lee, Yongin-si, KR;

Hyeyun Han, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-Si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/044 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0446 (2019.05); G06F 2203/04111 (2013.01); G06F 2203/04112 (2013.01);
Abstract

A display device is disclosed that includes a display panel and an input sensor including a plurality of conductive patterns. The conductive patterns include a first sensing electrode including first sensing patterns and bridge patterns, a second sensing electrode spaced apart from the first sensing electrode, and dummy patterns each overlapping the second sensing electrode and a first sensing pattern adjacent to the second sensing electrode in the first direction. Each of the bridge patterns is connected to two first sensing patterns through first contact holes. When a region, in which each of the plurality of dummy patterns overlaps each of the corresponding first sensing pattern and the second sensing electrode, is defined as an overlapping region, a dummy hole, which passes through a conductive pattern disposed on an upper part among the corresponding first sensing pattern, the second sensing electrode, and the plurality of dummy patterns, in a thickness direction, is defined in the overlapping region. Each of the bridge patterns is disposed between two dummy patterns in the second direction. Distances between the two dummy patterns and the bridge pattern, disposed between the two dummy patterns, are uniform in the second direction.


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