The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Feb. 01, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Assaf Kidron, Cupertino, CA (US);
Jiawei Shi, Santa Clara, CA (US);
Liang-Yu Chen, Taipei, TW;
Che-Kai Chang, Santa Clara, CA (US);
Tsu-Hui Yang, Dongkung Town, TW;
Nimrod Smith, Cupertino, CA (US);
Grant Wang, Cupertino, CA (US);
Preston Fung, Daly City, CA (US);
Vasuman Ghanapaati Srirangarajan, Karnataka, IN;
Davidi Kalir, Santa Clara, CA (US);
Rudolf C. Brunner, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IPS's). The IPS's are in a processing position prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.