The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Feb. 21, 2023
Moxtek, Inc., Orem, UT (US);
Daniel Bacon-Brown, Sandy, UT (US);
Bradley R. Williams, Pocatello, ID (US);
Moxtek, Inc., Orem, UT (US);
Abstract
Optical metasurfaces can manipulate a light wavefront without traditional lenses. They can include pillars with subwavelength dimensions on a substrate. The pillars can vary in size, shape, and spacing across a surface of the substrate. Each pillar size and shape can diffract incident light and provide a unique electromagnetic response. The metasurface can provide desired light wavefront manipulation without the thickness of traditional lenses. The metasurface can overcome the aberration problem of traditional lenses. An overcoat layer can be located at a distal-end of the pillars. Pillar pitch can be adjusted for uniform spacing between pillars, and uniform overcoat coverage. The overcoat layer can protect the pillars. An alternative to the overcoat layer is a solid fill-material filling gaps between the pillars.