The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2025

Filed:

Nov. 23, 2021
Applicant:

Faro Technologies, Inc., Lake Mary, FL (US);

Inventors:

Matthias Wolke, Korntal-Münchingen, DE;

Georgios Balatzis, Fellbach, DE;

Assignee:

FARO Technologies, Inc., Lake Mary, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01S 17/89 (2020.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
G01S 17/89 (2013.01); G06N 3/08 (2013.01);
Abstract

Examples described herein provide a method that includes aligning, by a processing device, a measured point cloud for an object with reference data for the object. The method further includes comparing, by the processing device, the measurement point cloud to the reference data to determine a displacement value between each point in the measurement point cloud and a corresponding point in the reference data. The method further includes generating, by the processing device, a deviation histogram of the displacement values between each point in the measurement point cloud and the corresponding point in the reference data. The method further includes identifying, by the processing device, a region of interest of the deviation histogram. The method further includes determining, by the processing device, whether a deviation associated with the object exists based at least in part on the region of interest.


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