The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Aug. 01, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Yi-Chiau Huang, Fremont, CA (US);
Errol Antonio C. Sanchez, Tracy, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/10 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/48 (2006.01); C23C 16/52 (2006.01); C30B 25/16 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C30B 25/105 (2013.01); C23C 16/4585 (2013.01); C23C 16/46 (2013.01); C23C 16/482 (2013.01); C30B 25/16 (2013.01); H01L 21/67115 (2013.01); C23C 16/45504 (2013.01); C23C 16/52 (2013.01); H01L 21/67248 (2013.01); H01L 21/67288 (2013.01);
Abstract
A method and apparatus for processing a semiconductor substrate is described. A substrate processing apparatus is disclosed that includes a process chamber, a substrate support disposed inside the process chamber, a plurality of lamps arranged in a lamphead and positioned proximate to the substrate support, a gas source for providing a purge gas in a lateral flow path across the substrate support, and a controller that differentially adjusts power to individual lamps of the plurality of lamps based on a direction of the flow path.