The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Sep. 14, 2021
Applicant:
Centrotherm International Ag, Blaubeuren, DE;
Inventors:
Jens-Uwe Fuchs, Blaubeuren, DE;
Mirko Tröller, Blaubeuren, DE;
Ralf Reize, Blaubeuren, DE;
Roland Leichtle, Blaubeuren, DE;
Assignee:
centrotherm international AG, Blaubeuren, DE;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/509 (2006.01); C23C 16/52 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4586 (2013.01); C23C 16/509 (2013.01); C23C 16/5096 (2013.01); C23C 16/52 (2013.01); H01J 37/3244 (2013.01); H01J 37/32522 (2013.01); H01L 21/67109 (2013.01);
Abstract
A device for plasma-enhanced chemical vapor deposition includes a process chamber configured to receive at least one workpiece carrier. The device is configured to heat the process chamber with the aid of at least one workpiece carrier that can be received by the process chamber. A system and a method for plasma-enhanced chemical vapor deposition are also provided.
Quick Actions:
Fuchs, Jens-Uwe. (2025). Device, system and method for plasma-enhanced chemical vapor deposition (U.S. Patent No. 12454756). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12454756
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile