The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Sep. 21, 2022
Applicant:
Jaewon Industrial Co., Ltd, Yeosu-si, KR;
Inventors:
Sung Won Shim, Yeosu-si, KR;
Byung Ki Son, Daejeon, KR;
Hwan Choi, Yeosu-si, KR;
Youn Soo Shin, Yeosu-si, KR;
Hwa Yeong Choi, Yeosu-si, KR;
Ho Jeong, Jeollanam-do, KR;
Assignee:
JAEWON INDUSTRIAL CO., LTD, Yeosu-si, KR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 67/56 (2006.01); C07C 67/54 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
C07C 67/56 (2013.01); C07C 67/54 (2013.01); G03F 7/161 (2013.01);
Abstract
Provided is a method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester (AGAECE) for photoresist processing, wherein the method comprises the step of distillation after passing industrial AGAECE through a porous adsorbent impregnated with a basic material, and it is possible to obtain a semiconductor-grade high-purity AGAECE maintaining a low acid value and high purity according to the present invention.