The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2025

Filed:

Feb. 27, 2025
Applicant:

Admatechs Co., Ltd., Miyoshi, JP;

Inventor:

Yusuke Watanabe, Miyoshi, JP;

Assignee:

ADMATECHS CO., LTD., Miyoshi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 7/18 (2006.01); C01B 33/18 (2006.01); C09C 1/30 (2006.01);
U.S. Cl.
CPC ...
C01B 33/18 (2013.01); C08K 7/18 (2013.01); C09C 1/3063 (2013.01); C01P 2004/03 (2013.01); C01P 2004/04 (2013.01); C01P 2004/32 (2013.01); C01P 2004/61 (2013.01); C01P 2004/62 (2013.01); C01P 2006/10 (2013.01); C01P 2006/14 (2013.01); C01P 2006/80 (2013.01); C08K 2201/005 (2013.01);
Abstract

An object is to provide a novel method for producing spherical silica particles having fine voids. That is, spherical silica particles according to the present disclosure contain silica as a main component, have an average particle diameter of 0.1 to 10.0 μm, a true specific gravity of 0.9 to 1.9 g/cm, the true specific gravity being measured with nitrogen gas, a pore volume of 0.1 mL/g or lower, an Na content of 10 ppm or lower, and a true specific gravity retention rate of 80% or higher, the true specific gravity retention rate being measured with nitrogen gas and being a rate between before and after pressurization is performed at 300 MPa for 1 minute, and include, in an existence proportion of 60% or lower, particles in each of which a maximum value among major axes of internal voids is not smaller than half a major axis of the particle.


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