The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2025

Filed:

Mar. 31, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sangmoon Lee, Suwon-si, KR;

Jinbum Kim, Seoul, KR;

Dongsuk Shin, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/417 (2006.01); H10D 30/62 (2025.01); H10D 62/815 (2025.01);
U.S. Cl.
CPC ...
H10D 30/6219 (2025.01); H10D 30/6211 (2025.01); H10D 62/8164 (2025.01);
Abstract

A semiconductor device includes: an active region extending on a substrate in a first direction; a gate structure intersecting the active region and extending on the substrate in a second direction; and a source/drain region on the active region on at least one side of the gate structure. The source/drain region may include a first epitaxial layer on the active region and including impurities of a first conductivity type in a first concentration, a second epitaxial layer on the first epitaxial layer and including the impurities of the first conductivity type in a second concentration, and a first barrier layer between the first epitaxial layer and the second epitaxial layer, wherein the first barrier layer includes doped oxygen.


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